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Will develop high-chi directed self-assembly materials for advanced node printing.
July 11, 2017
By: DAVID SAVASTANO
Editor, Ink World Magazine
Brewer Science Inc. announced from SEMICON West the extension of its partnership with Arkema to develop second-generation directed self-assembly (DSA) materials using high-x (chi) block copolymers. These new materials target advanced-node wafer patterning processes, because they enable even smaller feature sizes than first-generation DSA materials. As such, they provide a cost-effective solution to achieving device nodes down to 5nm and beyond, thereby enabling the continuation of Moore’s la...
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